CF,Mingchang Nanographic Wafer Defect Detection Equipment (921 Series),Electronic
SUMEC INTERNATIONAL TECHNOLOGY CO.,LTD
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CF,Mingchang Nanographic Wafer Defect Detection Equipment (921 Series),Electronic
SUMEC INTERNATIONAL TECHNOLOGY CO.,LTDThe supplier hasn’t listed a price. We can get their current prices and MOQ.
Verify from $29 · written report in 3 business days · 100% refund if not satisfied
About this product
- Size: ·
- Color: ·
- IP rating: Other
- Certification: Other
- Waterproof: Other
- Material: Other
- Exports to: Mainland China, Middle East, South Asia, USA and Canada
About this product
- Size: ·
- Color: ·
- IP rating: Other
- Certification: Other
- Waterproof: Other
- Material: Other
- Exports to: Mainland China, Middle East, South Asia, USA and Canada
Product details
| Size | · |
|---|---|
| Color | · |
| IP rating | Other |
| Certification | Other |
| Waterproof | Other |
| Material | Other |
| Usage | Other |
| Display method | Other |
| Customized | Other |
Product details
| Size | · |
|---|---|
| Color | · |
| IP rating | Other |
| Certification | Other |
| Waterproof | Other |
| Material | Other |
| Usage | Other |
| Display method | Other |
| Customized | Other |
From the supplier
CFW921 is a high specification FAB front-end nano pattern detection device that can benchmark against foreign competitors Kxx machines. It is equipped with dual TDI sensors, which can achieve synchronous imaging of bright and dark fields. One scan can simultaneously capture and detect images of both bright and dark fields, and can scan and detect more defects. It is suitable for multiple process stations such as ADI/AEI/CMP in FAB front-end.can meet the application scenarios of high sensitivity and high detection rate of defects.
From the supplier
CFW921 is a high specification FAB front-end nano pattern detection device that can benchmark against foreign competitors Kxx machines. It is equipped with dual TDI sensors, which can achieve synchronous imaging of bright and dark fields. One scan can simultaneously capture and detect images of both bright and dark fields, and can scan and detect more defects. It is suitable for multiple process stations such as ADI/AEI/CMP in FAB front-end.can meet the application scenarios of high sensitivity and high detection rate of defects.
About the supplier
- ✓Exhibited at 2 recent Canton Fairs
- ✓Foreign Trade Company
- ✓Founded 1999
- ✓1 certificate on file
Manufacturing exhibitors show in Phase 1 of the Canton Fair, 15 to 19 October 2026.
- Exhibited at 2 recent Canton Fairs
- Foreign Trade Company
- Founded 1999
- 1 certificate on file
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